UDC 620.1
STUDY OF INTERNAL STRESSES IN ALUMINUM LAYERS EVAPORATED ON DIELECTRIC SURFACES
D. Shimanovich, Researcher, Belarusian State University of Informatics and Radioelectronics, Minsk, Belarus, e-mail: ShDL@tut.by
Abstract. Analysis of internal stresses in evaporated aluminum layers formed at various sputtering regimes is demonstrated. Dependences of internal stresses on the thickness of aluminum films deposited at various substrate temperatures and evaporation rates are studied.
Keywords: internal stresses, aluminum layer, deposition, sputtering regimes, modulus of elasticity.
